MONOMER FOR HARDMASK COMPOSITION HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION

摘要

A monomer for a hard mask composition represented by Formula 1 below; A hard mask composition comprising the monomer, a polymer for a hard mask composition comprising the monomer structure, or a combination thereof; And a pattern forming method using the hard mask composition. [Chemical Formula 1] In Formula 1, A ¹ , A ² , L ⁰ , L ¹ and L ² are as defined in the specification.