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Patterning of vertical nanowire transistor channel and gate with directed self assembly
Patterning of vertical nanowire transistor channel and gate with directed self assembly
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机译:垂直纳米线晶体管沟道和栅极的定向自组装构图
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摘要
Directed self-assembly (DSA) material, or di-block co-polymer, to pattern features that ultimately define a channel region a gate electrode of a vertical nanowire transistor, potentially based on one lithographic operation. In embodiments, DSA material is confined within a guide opening patterned using convention lithography. In embodiments, channel regions and gate electrode materials are aligned to edges of segregated regions within the DSA material.
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