首页> 外国专利> IMAGING DEVICE FOR DEFECT INSPECTION, DEFECT INSPECTING SYSTEM, FILM MANUFACTURING DEVICE, IMAGING METHOD FOR DEFECT INSPECTION, DEFECT INSPECTING METHOD, AND FILM MANUFACTURING METHOD

IMAGING DEVICE FOR DEFECT INSPECTION, DEFECT INSPECTING SYSTEM, FILM MANUFACTURING DEVICE, IMAGING METHOD FOR DEFECT INSPECTION, DEFECT INSPECTING METHOD, AND FILM MANUFACTURING METHOD

机译:缺陷检查的成像设备,缺陷检查系统,膜制造设备,缺陷检查的成像方法,缺陷检查方法和膜制造方法

摘要

PROBLEM TO BE SOLVED: To provide an imaging device for defect inspection capable of improving a capacity to detect defects of different modes.;SOLUTION: An imaging device 12 for defect inspection comprises: a light source 17 for transmitted light arranged on a principal surface 110a side of a polarizing film 110; a light source 18 for reflected light arranged on a principal surface 110b side of the polarizing film 110; an area sensor 16 arranged on the principal surface 110b side and imaging a two-dimensional imaging region R; and transporting means 11 for transporting the polarizing film 110 in a transporting direction Y. The area sensor 16 comprises a transmitted light receiving region 19a and a reflected light receiving region 19b. The light source 17 for transmitted light is arranged so that the transmitted light L1 transmitted through the polarizing film 110 is made incident on the transmitted light receiving region 19a. The light source 18 for reflected light is arranged so that the reflected light L2 reflected in the polarizing film 110 is made incident on the reflected light receiving region 19b.;SELECTED DRAWING: Figure 3;COPYRIGHT: (C)2018,JPO&INPIT
机译:解决的问题:提供一种用于缺陷检查的成像装置,其能够提高检测不同模式的缺陷的能力。解决方案:用于缺陷检查的成像装置12包括:布置在主表面110a上的用于透射光的光源17偏光膜110的侧面;反射光用光源18配置在偏振膜110的主面110b侧。在主面110b侧配置有对二维摄像区域R进行摄像的区域传感器16。区域传感器16包括透射光接收区域19a和反射光接收区域19b;以及用于在偏振方向110上传输偏振膜110的传输装置11。布置用于透射光的光源17,使得透射过偏振膜110的透射光L1入射在透射光接收区域19a上。布置用于反射光的光源18,以使得在偏振膜110中反射的反射光L2入射在反射光接收区域19b上。;选择图:图3;版权:(C)2018,JPO&INPIT

著录项

  • 公开/公告号JP2018009800A

    专利类型

  • 公开/公告日2018-01-18

    原文格式PDF

  • 申请/专利权人 SUMITOMO CHEMICAL CO LTD;

    申请/专利号JP20160136786

  • 发明设计人 OKAMOTO HIDEKI;OZAKI MAYA;

    申请日2016-07-11

  • 分类号G01N21/892;

  • 国家 JP

  • 入库时间 2022-08-21 13:13:09

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