PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE

摘要

PROBLEM TO BE SOLVED: To provide a photoacid-generating compound that shows an improved balance of solubility and line width roughness.SOLUTION: A compound has the following structure (Ris hydroxyl, lactone or the like; Ris hydroxyl, lactone, -[(CH2) n-Y-SO3-Z+] and the like, Rand Reach independently represent hydrogen, cyano, alkyl or the like; Q is a substituted ethylene and the like, X is -CH2-, -O- or the like; n is 0, 1, or 2; Y is a C1-4 alkylene containing one or more fluorine atoms; Z+ is an organic cation).SELECTED DRAWING: None