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Nano vacuum gap device with a gate-all-around cathode

机译:具有环绕栅阴极的纳米真空间隙装置

摘要

A semiconductor power handling device, includes a cathode pillar, a gate surrounding the cathode pillar, and an anode spaced from the cathode by a nano-vacuum gap. An array of semiconductor power handling devices, each comprising a cathode pillar, a gate surrounding the cathode pillar, and an anode spaced from the cathode pillar by a nano-vacuum gap. The semiconductor power handling devices can be arranged as rows and columns and can be interconnected to meet the requirements of various applications. The array of power handling devices can be fabricated on a single substrate.
机译:一种半导体功率处理装置,包括:阴极柱;围绕阴极柱的栅极;和与阴极隔开纳米真空间隙的阳极。半导体功率处理设备的阵列,每个包括阴极柱,围绕阴极柱的栅极和与阴极柱隔开纳米真空间隙的阳极。半导体功率处理装置可以布置成行和列,并且可以互连以满足各种应用的需求。功率处理装置的阵列可以被制造在单个基板上。

著录项

  • 公开/公告号US9953796B2

    专利类型

  • 公开/公告日2018-04-24

    原文格式PDF

  • 申请/专利权人 HRL LABORATORIES LLC;

    申请/专利号US201615098108

  • 申请日2016-04-13

  • 分类号H01J1/62;H01J1/308;H01J1/304;H01J9/02;H01J21/10;

  • 国家 US

  • 入库时间 2022-08-21 12:57:41

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