SILICON-CONTAINING THIN FILM DEPOSITION COMPOSITION COMPRISING DISILYLAMINE COMPOUND AND METHOD FOR PREPARING SILICON-CONTAINING THIN FILM BY MEANS OF SAME

摘要

The present invention relates to a silicon-containing thin film deposition composition comprising a disilylamine compound and a method for preparing a silicon-containing thin film by means of same. A silicon-containing thin film deposition composition of the present invention enables preparation of a high-quality silicon-containing thin film by means of comprising as a silicon precursor a disilylamine compound which shows excellent reactivity, thermal stability and high volatility.