A method for producing a resin for a semiconductor device manufacturing process, a method for producing a resin, a method for producing a resin, an actinic ray-sensitive or radiation-sensitive resin composition, and an actinic ray-sensitive or radiation-

摘要

As a unit with silicon,As a standard substance, Pu Measles was used.As a measurement method, according to JIS K0101:1998, which uses integral port measurement method, the predominance is based on the method of forming film from the component of unit resin (A) below 1 ppm.Especially ultra-fine patterns (e.g.It has lines and spatial patterns below 50nm.In the hall mode below 50 nm,A pattern formation method that can significantly improve the defective performance of a company.Provides manufacturing methods for electronic Devis.In addition, according to the previous Monomomomomer model of semiconductor Disce manufacturing process with previous effect, using this model, resin, resin manufacturing method, persimmon active light or absorbent resin composition, Active ray or surveillance film.