PHOTOSENSITIVE RESIN COMPOSITION METHOD FOR PRODUCING PATTERN MEMS STRUCTURE METHOD FOR PRODUCING THE STRUCTURE METHOD FOR DRY ETCHING METHOD FOR WET ETCHING MEMS SHUTTER DEVICE AND IMAGE DISPLAY APPARATUS

摘要

The photosensitive resin composition for an etching resist or MEMS structural member of the present invention is characterized in that (A) a carboxyl group or a phenolic hydroxyl group has a monomer unit (a1) having a moiety protected with an acid-decomposable group, , A polymer having a monomer unit (a2), a component (B), a photo acid generator, and (C) a solvent.;