METHOD OF CHARACTERISING METHOD OF FORMING A MODEL METHOD OF SIMULATING MASK MANUFACTURING METHOD AND DEVICE MANUFACTURING METHOD

摘要

A method of characterizing a lithographic mask type utilizes a mask having test pattern units of linear features on the mask in different orientations. The mask is exposed, rotated 90 , exposed again, and rotated 90 . Printed features are measured to determine the characteristics of the mask. The present invention can be used to model the shadowing effects of EUV masks with thicker absorbers that are illuminated with an angle.;