INTERNAL FARADAY SHIELD HAVING DISTRIBUTED CHEVRON PATTERNS AND CORRELATED POSITIONING RELATIVE TO EXTERNAL INNER AND OUTER TCP COIL

摘要

Plasma processing chambers with internal Faraday shields with defined groove configurations are defined. In one example, the chamber includes an electrostatic chuck for receiving a substrate, and a dielectric window connected to an upper portion of the chamber, wherein the dielectric window is disposed on the electrostatic chuck. A Faraday shield disposed within the chamber is also included and is defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range, an intermediate zone having an intermediate radius range, and an outer zone having an outer radius range, wherein the inner zone is adjacent to the middle zone and the middle zone is adjacent to the outer zone. Further definition of the Faraday shield includes a first set of radiation slots (A) extending through the inner zone, the middle zone, and the outer zone, a second set of radiation slots (C) extending through only the outer zone; And a third set of radiation slots B extending through the middle and outer zones. In this configuration, the first, second, and third radiating slots are arranged radially around the Faraday shield in a repeating pattern of slots A, C, B, and C.