首页> 外国专利> SILICON CARBIDE INK CRYSTAL, SILICON CARBIDE INKRISTAL WAFER, SILICON CARBIDE INKRISTAL PEITAXIAL WAFER AND ELECTRONIC DEVICE

SILICON CARBIDE INK CRYSTAL, SILICON CARBIDE INKRISTAL WAFER, SILICON CARBIDE INKRISTAL PEITAXIAL WAFER AND ELECTRONIC DEVICE

机译:碳化硅墨水晶体,碳化硅墨水晶片,碳化硅墨水尖端晶片和电子设备

摘要

A silicon carbide single crystal (2,3) comprises: threaded dislocations (20) each having a dislocation line (21) extending through a C-plane and a Burgers vector (bv) containing at least one component in a C-axis direction, having. In addition, the density of thread offsets (θ1), each of which is formed by an orientation of the Burger vector and an orientation of the dislocation line that are greater than 0 ° and within 40 °, is set to 300 dislocations / cm or less. Further, the density of thread dislocations where the angles are greater than 40 ° is set to 30 dislocations / cm or less.
机译:碳化硅单晶(2,3)包括:螺纹位错(20),每个都具有穿过C平面延伸的位错线(21)和在C轴方向上包含至少一个成分的Burgers向量(bv),有。此外,将线偏移的密度(θ1)设置为300个位错/ cm,该偏移分别由Burger矢量的方向和位错线的方向大于0°且在40°以内形成。减。此外,将角度大于40°的线位错的密度设定为30位错/ cm以下。

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