New compound, photopolymerization initiator comprising this compound, and photosensitive resin composition containing the photopolymerization initiator

摘要

The purpose of the present invention is to provide: a novel compound capable of generating a base and a radical upon irradiation with an active energy ray; a photopolymerization initiator comprising the novel compound; and a photosensitive resin composition containing the photopolymerization initiator has high sensitivity and excellent storage stability and can be molded into a cured article having no metal corrosive properties. The new compound is represented by the formula (1): (wherein R ₁ to R _{6 are} independently a hydrogen atom, a hydroxyl group, an alkoxy group, another organic group other than the above-mentioned substituents, or the like; X is a group having such a structure that n represents hydrogen atoms of a saturated hydrocarbon containing a ring structure are removed and n is an integer of 1 to 6).