首页> 外国专利> INSPECTION TOOL, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC SYSTEM, INSPECTION METHOD AND DEVICE MANUFACTURING METHOD

INSPECTION TOOL, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC SYSTEM, INSPECTION METHOD AND DEVICE MANUFACTURING METHOD

机译:检查工具,光刻设备,光刻系统,检查方法和设备制造方法

摘要

An inspection tool for inspecting a semiconductor substrate is described, the inspection tool comprising:- an substrate table configured to hold the substrate;- an electron beam source configured to project an electron beam onto an area of interest of the substrate, the area of interest comprising a buried structure;- a cathode-luminesce detector configured to detect cathodoluminescent light emitted from the buried structure;- a control unit configured to:- control the electron beam source to project to electron beam onto the area of interest;- receive a signal representative of the detected cathodoluminescent light;- determine, based on the signal, a characteristic of the buried structure.
机译:描述了一种用于检查半导体衬底的检查工具,该检查工具包括:-构造成保持基板的基板台;-电子束源,被配置为将电子束投射到所述衬底的感兴趣区域上,所述感兴趣区域包括掩埋结构;-阴极发光检测器,被配置为检测从掩埋结构发射的阴极发光光;-配置为:-控制电子束源以将电子束投射到感兴趣的区域上;-接收代表检测到的阴极发光光的信号;-根据信号确定掩埋结构的特征。

著录项

  • 公开/公告号EP3428726A1

    专利类型

  • 公开/公告日2019-01-16

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号EP20170181208

  • 发明设计人 QUINTANILHA RICHARD;SMAKMAN ERWIN PAUL;

    申请日2017-07-13

  • 分类号G03F9/00;G01N23/225;G01R31/305;

  • 国家 EP

  • 入库时间 2022-08-21 12:26:53

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