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Using customized lens pupil optimization to enhance lithographic imaging in a source-mask optimization scheme
Using customized lens pupil optimization to enhance lithographic imaging in a source-mask optimization scheme
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机译：在源掩膜优化方案中使用定制的镜头光瞳优化来增强光刻成像
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摘要
A process for use in configuring a projection optics lithography system comprising providing a determination of pupil amplitude and phase optimization for the projection optics, for use in configuring the projection optics in accordance with the determination.
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