首页> 外国专利> COMPARATOR HAVING DIFFERENTIAL FDSOI TRANSISTOR PAIR WITH GATE CONNECTED TO BACK-GATE TO REDUCE RTS NOISE

COMPARATOR HAVING DIFFERENTIAL FDSOI TRANSISTOR PAIR WITH GATE CONNECTED TO BACK-GATE TO REDUCE RTS NOISE

机译:比较器具有差分FDSOI晶体管对,其栅极连接到反向栅极以减小RTS噪声

摘要

Embodiments of the present disclosure provide a circuit structure including: a first transistor having a gate, a drain connected to a first node, a FDSOI channel region positioned between a source and the drain, a back-gate, separated from the FDSOI channel with a buried insulator layer positioned beneath the FDSOI channel, wherein the back-gate of the first transistor and a first input signal voltage are connected to the gate of the first transistor, and the source is connected to a first shared node; and a second transistor having a gate, a source connected to the first shared node, a drain connected to a second node, a FDSOI channel positioned between the source and drain, and a buried insulator positioned beneath the FDSOI channel and a back-gate, wherein the back-gate of the second transistor and a second input signal voltage are connected to the gate of the second transistor.
机译:本公开的实施例提供一种电路结构,该电路结构包括:第一晶体管,其具有栅极;漏极,其连接至第一节点; FDSOI沟道区,其位于源极和漏极之间;背栅,通过FDSOI沟道与FDSOI沟道分开。掩埋绝缘层位于FDSOI通道下方,其中,第一晶体管的背栅和第一输入信号电压连接至第一晶体管的栅,源极连接至第一共享节点。第二晶体管,其具有栅极,连接至第一共享节点的源极,连接至第二节点的漏极,位于源极与漏极之间的FDSOI沟道,以及位于FDSOI沟道下方的掩埋绝缘体和背栅,其中第二晶体管的背栅极和第二输入信号电压连接到第二晶体管的栅极。

著录项

  • 公开/公告号US2019199336A1

    专利类型

  • 公开/公告日2019-06-27

    原文格式PDF

  • 申请/专利权人 GLOBALFOUNDRIES INC.;

    申请/专利号US201715850702

  • 发明设计人 VIJAY KANAGALA;DON R. BLACKWELL;

    申请日2017-12-21

  • 分类号H03K5/24;H01L27/12;H03K17/16;

  • 国家 US

  • 入库时间 2022-08-21 12:07:32

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