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A lithography apparatrus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
A lithography apparatrus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
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机译:光刻设备,用于提供设定点数据的设备,设备制造方法,用于提供设定点数据的方法和计算机程序
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摘要
An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.
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