首页> 外国专利> INSPECTION TOOL, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC SYSTEM, INSPECTION METHOD AND DEVICE MANUFACTURING METHOD

INSPECTION TOOL, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC SYSTEM, INSPECTION METHOD AND DEVICE MANUFACTURING METHOD

机译:检查工具,光刻设备,光刻系统,检查方法和设备制造方法

摘要

An inspection tool for inspecting a semiconductor substrate is described, the inspection tool comprising: - a substrate table configured to hold the substrate; - an electron beam source configured to project an electron beam onto an area of interest of the substrate; - a cathode-luminesce detector configured to detect cathodoluminescent light emitted from the area of interest; - a control unit configured to: - receive a signal representative of the detected cathodoluminescent light; - determine, based on the signal, a stress distribution of the area of interest.
机译:描述了一种用于检查半导体衬底的检查工具,该检查工具包括:-被配置为保持衬底的衬底台; -电子束源,被配置为将电子束投射到衬底的感兴趣区域上; -阴极发光检测器,被配置为检测从感兴趣区域发射的阴极发光光; -控制单元,其被配置为:-接收代表所检测的阴极发光的信号; -根据信号确定感兴趣区域的应力分布。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号