Ion source head and ion implantation apparatus including the same

摘要

An ion source head according to an embodiment of the present invention includes: a reaction chamber for providing an ionization space; A plasma generation coil disposed on an outer surface of the reaction chamber to receive an RF power and form an induction magnetic field in the reaction chamber to ionize the source gas supplied to the reaction chamber; And a high frequency power source for applying the high frequency power to the plasma generation coil.