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Metrology parameter determination and metrology recipe selection
Metrology parameter determination and metrology recipe selection
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机译:计量参数确定和计量配方选择
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摘要
For a metrology target with a first bias target structure and a second different bias target structure created using the patterning process, a metro containing signal data for the first target structure vs. signal data for the second target structure. Retrieving statistic data, where statistic data is acquired for a number of different metrology recipes, each metrology recipe specifies and retrieves different parameters of measurement, and multiple different as a reference. Determining statistics, fitting curves, or fitting functions that pass through the metrology data for a metrology recipe, and a set of at least two different metrology recipes from criteria parameters that exceed or meet a particular threshold. A method comprising identifying at least two different metrology recipes having. [Selection diagram]
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