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Metrology parameter determination and metrology recipe selection

机译:计量参数确定和计量配方选择

摘要

For a metrology target with a first bias target structure and a second different bias target structure created using the patterning process, a metro containing signal data for the first target structure vs. signal data for the second target structure. Retrieving statistic data, where statistic data is acquired for a number of different metrology recipes, each metrology recipe specifies and retrieves different parameters of measurement, and multiple different as a reference. Determining statistics, fitting curves, or fitting functions that pass through the metrology data for a metrology recipe, and a set of at least two different metrology recipes from criteria parameters that exceed or meet a particular threshold. A method comprising identifying at least two different metrology recipes having. [Selection diagram]
机译:对于具有通过图案化过程创建的具有第一偏置目标结构和第二不同偏置目标结构的计量目标,地铁包含用于第一目标结构的信号数据与用于第二目标结构的信号数据。检索统计数据,其中为许多不同的计量配方获取统计数据,每个计量配方指定并检索不同的测量参数,并且将多个不同的参数作为参考。确定通过度量衡配方的度量衡数据传递的统计信息,拟合曲线或拟合函数,以及根据超过或满足特定阈值的标准参数确定的一组至少两个不同度量衡配方。一种方法,包括识别具有的至少两个不同的计量配方。 [选择图]

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