METHOD FOR CORRECTING PHOTOMASK SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK SUBSTRATE, METHOD FOR TREATING PHOTOMASK SUBSTRATE, PHOTOMASK SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK, AND SUBSTRATE TREATING DEVICE

摘要

To correct a defect in a photomask without much requiring a time and man-hours, and thereby, to improve production efficiency and qualities in manufacturing a photomask.SOLUTION: A method for correcting a photomask substrate is provided, which includes: a step of preparing a photomask substrate 10 having an optical film 200 for forming a transfer pattern, formed on one main surface of a transparent substrate 100; and a correction step of forming a correction film with respect to a gap defect that occurs in the optical film 200. The correction step is carried out by, while supplying a raw material gas to the vicinity of the position where the gap defect is present on a first main surface of the photomask substrate 10 where the optical film is formed, irradiating the photomask substrate 10 through a second main surface side thereof with a laser beam and allowing the raw material gas to react by the laser beam transmitted through the gap defect to deposit a correction film at the position of the gap defect on the first main surface.SELECTED DRAWING: Figure 6