首页> 外国专利> PLASMON RESONANCE STRUCTURE, PLASMON RESONANCE SENSOR AND PLASMON RESONANCE MEASUREMENT SYSTEM USING THE SAME, AND METHOD FOR MANUFACTURING PLASMON RESONANCE STRUCTURE

PLASMON RESONANCE STRUCTURE, PLASMON RESONANCE SENSOR AND PLASMON RESONANCE MEASUREMENT SYSTEM USING THE SAME, AND METHOD FOR MANUFACTURING PLASMON RESONANCE STRUCTURE

机译:等离子共振结构,等离子共振传感器和等离子测量系统以及制造等离子共振结构的方法

摘要

To provide a plasmon resonance structure which can excite plasmon resonances with two different wavelengths by an emission of one polarization.SOLUTION: A plasmon resonance structure 10 includes a substrate 11 and a metal layer 14. The metal layer 14 includes a nano-structure 21, a nano-structure 22 larger in size than the nano structure 21, and a frame 25 surrounding the nano structures 21 and 22 and electrically connecting the nano-structures 21 and 22 to each other. The nano-structure 21 has a sharp part T1 and the nano-structure 22 has a sharp part T2. The nano-structures 21 and 22 are arranged so that the sharp parts T1 and T2 face each other.SELECTED DRAWING: Figure 3
机译:为了提供一种等离子体共振结构,该等离子体共振结构可以通过发射一个偏振来激发具有两种不同波长的等离子体共振。解决方案:等离子体共振结构10包括基板11和金属层14。金属层14包括纳米结构21,纳米结构22的尺寸大于纳米结构21的尺寸,框架25围绕纳米结构21和22并将纳米结构21和22彼此电连接。纳米结构21具有尖锐的部分T1,并且纳米结构22具有尖锐的部分T2。纳米结构21和22的排列方式使尖锐部分T1和T2彼此面对。

著录项

  • 公开/公告号JP2019219272A

    专利类型

  • 公开/公告日2019-12-26

    原文格式PDF

  • 申请/专利权人 UNIV PUBLIC CORP OSAKA;

    申请/专利号JP20180116733

  • 发明设计人 ENDO TATSURO;YAMADA OZORA;

    申请日2018-06-20

  • 分类号G01N21/552;B82Y40;B82Y15;

  • 国家 JP

  • 入库时间 2022-08-21 11:33:16

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