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METHOD FOR FORMING OLED ORGANIC THIN FILM LAYERS FOR USING RF SPUTTERING APPARATUS, RF SPUTTERING APPARATUS, AND APPARATUS FOR FORMING TARGET TO BE USED IN RF SPUTTERING APPARATUS
METHOD FOR FORMING OLED ORGANIC THIN FILM LAYERS FOR USING RF SPUTTERING APPARATUS, RF SPUTTERING APPARATUS, AND APPARATUS FOR FORMING TARGET TO BE USED IN RF SPUTTERING APPARATUS
Provided is a method for forming a thin film layer of a luminescent organic material for an OLED using an RF sputtering apparatus. The method includes steps of: placing a target comprising a target material for forming a thin film layer of an luminescent organic material for an OLED at a cathode in a chamber of an RF sputtering apparatus and disposing a substrate in which the target material is to be deposited in the chamber; maintaining the chamber in a vacuum state and injecting a reaction gas into the chamber; and applying a minimum RF power and a maximum magnetic field to the target that are sufficient to generate a plasma without damaging the target material.
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