首页> 外国专利> METHOD FOR PRODUCING VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREPARATION BODY, METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT, METHOD FOR PRODUCING ORGANIC EL DISPLAY, AND VAPOR DEPOSITION MASK

METHOD FOR PRODUCING VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREPARATION BODY, METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT, METHOD FOR PRODUCING ORGANIC EL DISPLAY, AND VAPOR DEPOSITION MASK

机译:气相沉积掩模的制造方法,气相沉积掩模的制备体,有机半导体元素的制备方法,有机EL显示器的制备方法和气相沉积掩模

摘要

A vapor deposition mask preparation body in which a metal mask is provided on one surface of a resin plate for obtaining a resin mask, and a protective sheet with peel strength not less than about 0.0004 N/10 mm and less than about 0.2 N/10 mm in conformity with JIS Z-0237:2009 is provided on the other surface of the resin plate is prepared, with respect to the vapor deposition mask preparation body, the resin plate is irradiated with laser light from the metal mask side to form a resin mask opening corresponding to a pattern to be produced by vapor deposition in the resin plate, and the protective sheet is peeled off from the resin mask in which the resin mask opening corresponding to the pattern to be produced by vapor deposition is formed.
机译:一种气相沉积掩模制备体,其中在树脂板的一个表面上提供金属掩模以获得树脂掩模,以及剥离强度不小于约0.0004 N / 10 mm且小于约0.2 N / 10的保护片在准备的树脂板的另一面上设置符合JIS Z-0237:2009的mm,相对于蒸镀掩模制备体,从金属掩模侧照射激光以形成树脂。将与通过气相沉积在树脂板上形成的图案相对应的掩模开口,并且从其中形成有与通过气相沉积而形成的图案相对应的树脂掩模开口的树脂掩模上剥离保护片。

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