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APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM

机译:离子束系统中束映射的装置和技术

摘要

An apparatus for monitoring of an ion beam. The apparatus may include a processor; and a memory unit coupled to the processor, including a display routine, where the display routine operative on the processor to manage monitoring of the ion beam. The display routine may include a measurement processor to receive a plurality of spot beam profiles of the ion beam, the spot beam profiles collected during a fast scan of the ion beam and a slow mechanical scan of a detector, conducted simultaneously with the fast scan. The fast scan may comprise a plurality of scan cycles having a frequency of 10 Hz or greater along a fast scan direction, and the slow mechanical scan being performed in a direction parallel to the fast scan direction. The measurement processor may also send a display signal to display at least one set of information, derived from the plurality of spot beam profiles.
机译:一种用于监测离子束的设备。该设备可以包括处理器;以及处理器。以及与处理器耦合的存储单元,包括显示例程,其中该显示例程在处理器上操作以管理对离子束的监视。显示例程可以包括测量处理器,以接收离子束的多个点束轮廓,在离子束的快速扫描和检测器的缓慢机械扫描期间收集的点束轮廓,该扫描与快速扫描同时进行。快速扫描可以包括沿着快速扫描方向具有10Hz或更大的频率的多个扫描周期,并且慢速机械扫描是在与快速扫描方向平行的方向上执行的。测量处理器还可以发送显示信号以显示从多个点波束轮廓导出的至少一组信息。

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