Post-treatment devices and methods for at least gas post-treatment downstream of fluidized bed gasification systems, and logic devices and uses

摘要

The present invention relates to a post-treatment device 10 for post-processing at least gas downstream of a fluidized-bed gasification process, particularly downstream of the HTW gasifier 1 of a pressurized fluidized-bed gasification process, while being downstream of the fluidized-bed gasification process and gas It has a particle separation unit (2; 11) that can be disposed upstream of the gas cooler (3), which can be used for further post-treatment of the post-treatment device, the gasification vapor (B) that can be connected to the fluidized bed gasification process And an intermediate cooling unit 12 which is provided with a recovery unit B1 for and can be arranged downstream of the fluidized bed gasification process and upstream of the particle separation unit 11. In addition, the present invention relates to a method of post-treating at least a gas downstream of a fluidized bed gasification process and the use of an intermediate cooling unit.