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MEMS MEMS membrane structure and method for fabricating thereof

机译:MEMS MEMS膜结构及其制造方法

摘要

The present invention relates to a method for manufacturing a MEMS membrane structure, which includes the following steps of: forming a silicon oxide film dam structure on a silicon substrate; forming a sacrificial layer after depositing an adhesive layer; depositing a surface protective film on the sacrificial layer; forming trenches in a first row to a third row on the silicon oxide film dam structure by etching the surface protective film and the sacrificial layer; forming a membrane by depositing a support film at the inside of the trenches in the first row to the third row and on the surface protective film of the sacrificial layer; and forming an empty space by removing the sacrificial layer inside the support film deposited at the first row.
机译:本发明涉及一种MEMS膜结构的制造方法,其包括以下步骤:在硅基板上形成氧化硅膜坝结构;在沉积粘合剂层之后形成牺牲层;在牺牲层上沉积表面保护膜;通过蚀刻表面保护膜和牺牲层,在氧化硅膜坝结构上形成第一行至第三行的沟槽;通过在第一行至第三行的沟槽内部和牺牲层的表面保护膜上沉积支撑膜来形成膜;通过去除沉积在第一行的支撑膜内部的牺牲层来形成空的空间。

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