Realization of Large Scale Mid-Infrared Plasmon in Graphene Based on Epsilon-Near-Zero Silicon Carbide Substrate

摘要

A graphene plasmon resonator and a method of manufacturing the same are provided, comprising a substrate having the properties of Epsilon-Near-Zero (ENZ) and a graphene plasmon resonator pattern formed on the substrate. The graphene plasmon resonator generates a plasmon resonance when irradiated with infrared light (eg, mid-infrared light), and is used to construct an infrared (middle infrared) optical element.