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Mass Transfer of Phosphorus in Silicon Melts Under Vacuum Induction Refining

机译:真空感应精炼过程中硅熔体中磷的质量转移

摘要

An experimental investigation into the mass transfer of phosphorus in molten silicon under vacuum induction refining has been carried out. In a pilot-scale experiment, in the temperature range 1773 K (1500 A degrees C) to 1873 K (1600 A degrees C) and a vacuum of 0.1 to 0.035 Pa smelting for 7200 seconds (2 hours), phosphorus is decreased from 15 ppmw to 0.08 ppmw, which achieved the target for solar-grade silicon of less than 0.1 ppmw. Lab-scale experiments are used to determine the effects of vacuum, refining time, and temperature on the rate of mass transfer of phosphorus during vacuum refining. Hardly any phosphorus was removed when the vacuum pressure is greater than 100 Pa. Mass-transfer coefficients are nearly independent of pressure at 1783 K (1510 A degrees C) when pressures are below 0.1 Pa and are highly correlated with vacuum pressures above 0.1 Pa. A model of vacuum refining of inductively stirred silicon melts is discussed to explain the transfer path of phosphorus out of the melt.
机译:进行了真空感应精炼过程中熔融硅中磷的传质实验研究。在中试规模的实验中,在1773 K(1600 A摄氏度)至1773 K(温度)的温度范围内,冶炼7200秒(2小时)的真空度为0.1至0.035 Pa,磷从15降低了ppmw至0.08 ppmw,从而实现了太阳能级硅的目标,其目标是小于0.1 ppmw。实验室规模的实验用于确定真空精制过程中真空度,精制时间和温度对磷传质速率的影响。当真空压力大于100 Pa时,几乎没有磷被除去。当压力低于0.1 Pa时,传质系数几乎与1783 K(1510 A摄氏度)下的压力无关,并且与高于0.1 Pa的真空压力高度相关。讨论了真空精炼感应搅拌硅熔体的模型,以解释磷从熔体中的转移路径。

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