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Electronic transport and device prospects of monolayer molybdenum disulphide grown by chemical vapour deposition

机译:化学气相沉积法生长单层二硫化钼的电子输运及器件前景

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摘要

Layered transition metal dichalcogenides display a wide range of attractive physical and chemical properties and are potentially important for various device applications. Here we report the electronic transport and device properties of monolayer molybdenum disulphide grown by chemical vapour deposition. We show that these devices have the potential to suppress short channel effects and have high critical breakdown electric field. However, our study reveals that the electronic properties of these devices are at present severely limited by the presence of a significant amount of band tail trapping states. Through capacitance and ac conductance measurements, we systematically quantify the density-of-states and response time of these states. Because of the large amount of trapped charges, the measured effective mobility also leads to a large underestimation of the true band mobility and the potential of the material. Continual engineering efforts on improving the sample quality are needed for its potential applications.
机译:层状过渡金属二卤化物显示出广泛的有吸引力的物理和化学性质,对于各种设备应用可能具有重要意义。在这里,我们报告通过化学气相沉积法生长的单层二硫化钼的电子传输和器件性能。我们证明了这些器件具有抑制短沟道效应的潜力,并具有很高的临界击穿电场。但是,我们的研究表明,这些设备的电子性能目前受到明显的带尾俘获状态的严重限制。通过电容和交流电导率测量,我们系统地量化了这些状态的状态密度和响应时间。由于大量的捕获电荷,因此测得的有效迁移率还会导致对真实带迁移率和材料电势的低估。潜在的应用需要持续的工程工作来提高样品质量。

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