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Effect of sputtering power on friction coefficient and surface energy of co-sputtered titanium and molybdenum disulfide coatings and its performance in micro hot-embossing

机译:溅射功率对共溅射钛及二硫化钼涂层摩擦系数和表面能的影响及其在微热压印中的表现

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摘要

Si micromolds are common for fabrication of polymer-based microfluidic devices by hot-embossing because of the well established fabrication methods for Si, e.g., deep reactive ion etching, for favorable surface finish and accuracy. The problems with low yield, poor reproducibility, premature failure and limited lifetime of a Si micromold are induced by high friction and surface adhesion generated during demolding. Therefore, Titanium (Ti) and molybdenum disulfide (MoS[subscript 2]) coatings were deposited on Si micromolds via magnetron co-sputtering at various combinations of target powers to improve its surface properties. Coating composition, crystallographic orientation, roughness, critical load, hardness, friction coefficient and surface energy were measured by X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscopy, scratch testing, nanoindentation, ball-on-disc tribometry and the contact angle method respectively. A statistical design of experiment matrix was used to investigate the effect of the Ti and MoS[subscript 2] target powers on the friction coefficient and surface energy of the coatings. From this designed experiment, it was observed that increasing MoS[subscript 2] target power was associated with increasing surface energy and decreasing friction coefficient and target powers had statistically significant effects on these parameters. Crystallinity, roughness and hardness of the coatings increased with increasing Ti concentration. A mathematical model of the effects of Ti and MoS[subscript 2] target powers on the friction coefficient and surface energy of the coatings has been fit to the experimental results using the response surface method. Uncoated and MoS[subscript 2]–Ti coated Si micromolds were used in hot-embossing for a comparative study on replication performance of uncoated and various coated micromolds. Hotembossed PMMA microstructures showed that coating improve replication performance of Si micromolds. Si micromold coated with co-sputter of Ti and MoS[subscript 2] at power of 300 and 75 W respectively, showed better replication quality among the selected target powers.
机译:Si微模具通常通过热压印用于制造基于聚合物的微流体器件,这是因为用于Si的良好建立的制造方法,例如深反应性离子蚀刻,具有良好的表面光洁度和精度。脱模过程中产生的高摩擦力和表面粘附性导致了硅微模具的产量低,可重复性差,过早失效和寿命有限的问题。因此,通过磁控管共溅射以不同的目标功率组合将钛(Ti)和二硫化钼(MoS [下标2])涂层沉积在Si微模具上,以改善其表面性能。通过X射线光电子能谱,X射线衍射,原子力显微镜,划痕测试,纳米压痕,圆盘摩擦学和接触来测量涂层的成分,晶体学取向,粗糙度,临界载荷,硬度,摩擦系数和表面能。角度法。采用实验矩阵统计设计方法研究了Ti和MoS [下标2]目标功率对涂层摩擦系数和表面能的影响。从这个设计的实验中,可以看出增加MoS [下标2]目标功率与增加表面能和降低摩擦系数有关,目标功率对这些参数具有统计学上的显着影响。钛的浓度越高,涂层的结晶度,粗糙度和硬度越高。 Ti和MoS [下标2]目标功率对涂层的摩擦系数和表面能的影响的数学模型已通过响应表面法拟合到实验结果。将未涂覆的和MoS [下标2] -Ti涂覆的Si微模具用于热压印,以比较未涂覆和各种涂覆的微模具的复制性能。热压印的PMMA微观结构表明,涂层可改善Si微模具的复制性能。在功率分别为300和75 W的条件下,用Ti和MoS [下标2]共同溅射涂覆的Si微模具在选定的目标功率中表现出更好的复制质量。

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