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An ultra-compact virtual source FET model for deeply-scaled devices: Parameter extraction and validation for standard cell libraries and digital circuits

机译:用于深度设备的超紧凑虚拟源FET模型:标准单元库和数字电路的参数提取和验证

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摘要

In this paper, we present the first validation of the virtual source (VS) charge-based compact model for standard cell libraries and large-scale digital circuits. With only a modest number of physically meaningful parameters, the VS model accounts for the main short-channel effects in nanometer technologies. Using a novel DC and transient parameter extraction methodology, the model is verified with simulated data from a well-characterized, industrial 40-nm bulk silicon model. The VS model is used to fully characterize a standard cell library with timing comparisons showing less than 2.7% error with respect to the industrial design kit. Furthermore, a 1001-stage inverter chain and a 32-bit ripple-carry adder are employed as test cases in a vendor CAD environment to validate the use of the VS model for large-scale digital circuit applications. Parametric Vdd sweeps show that the VS model is also ready for usage in low-power design methodologies. Finally, runtime comparisons have shown that the use of the VS model results in a speedup of about 7.6×.
机译:在本文中,我们对标准单元库和大规模数字电路的基于虚拟源(VS)电荷的紧凑模型进行了首次验证。 VS模型仅具有少量有意义的物理意义参数,从而解决了纳米技术中的主要短通道效应。使用一种新颖的直流电和瞬态参数提取方法,该模型已通过性能良好的工业40纳米体硅模型的仿真数据进行了验证。 VS模型用于全面表征标准单元库,时序比较显示相对于工业设计套件的误差小于2.7%。此外,在供应商的CAD环境中,使用了1001级反相器链和32位带脉动加法器作为测试用例,以验证VS模型在大规模数字电路应用中的使用。参数Vdd扫描显示VS模型也已准备好在低功耗设计方法中使用。最终,运行时比较表明,VS模型的使用使速度提高了约7.6倍。

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