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Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterened polysilicon

机译：等离子多晶硅氯蚀刻等离子体表面动力学研究及特征剖面演化模拟

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by Jane Pei-chen Chang.

机译：简培Pe

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Chang Jane Pei-chen 1967-;
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年度 1998
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原文格式 PDF
正文语种 eng
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1. Atomic-scale Cellular Model And Profile Simulation Of Poly-si Gate Etching In High-density Chlorine-based Plasmas: Effects Of Passivation Layer Formation On Evolution Of Feature Profiles [J] . Yugo Osano, Kouichi Ono Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2008,第4期

机译：高密度氯基等离子体中多晶硅栅刻蚀的原子尺度细胞模型和轮廓模拟：钝化层形成对特征轮廓演变的影响
2. Molecular-beam study of the plasma-surface kinetics of silicon dioxide and photoresist etching with chlorine [J] . Jane P.Chang, Herbert H.Sawin Journal of Vacuum Science & Technology. B . 2001,第4期

机译：二氧化硅等离子体表面动力学的分子束研究和氯气光刻胶蚀刻
3. Study on feature profile evolution for chlorine etching of silicon in an RF biased sheath (Conference Paper) [J] . Dai Z.-L., Zhang S.-Q., Wang Y.-N. Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2013,第Null期

机译：射频偏置护套中硅的氯蚀刻的特征轮廓演变研究（会议论文）
4. Beam study of plasma-surface kinetics and simulation of feature profile evolution in Cl_2 and HBr etching of polysilicon [C] . Weidong Jin, Herbert H.Sawin, Steven A.Vitale Meeting of the Electrochemical Society . 2002

机译：多晶硅CL_2和HBR蚀刻特征型材演化的等离子体表面动力学和仿真的光束研究
5. Kinetic Modeling of Halogen-Based Plasma Etching of Complex Oxide Films and its Application to Predictive Feature Profile Simulation. [D] . Marchack, Nathan Philip. 2012

机译：复杂氧化物薄膜的基于卤素的等离子体刻蚀动力学模型及其在预测特征轮廓模拟中的应用。
6. The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O [O] . Na Zhou, Junjie Li, Haiyang Mao, 2020

机译：基于HBr / O的重掺杂多晶硅反应离子蚀刻的研究
7. Atomic-scale cellular model and profile simulation of poly-Si gate etching in high-density chlorine-based plasmas: Effects of passivation layer formation on evolution of feature profiles [O] . Osano Yugo, Ono Kouichi 2008

机译：高密度氯基等离子体中多晶硅栅刻蚀的原子尺度细胞模型和轮廓模拟：钝化层形成对特征轮廓演变的影响

Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterened polysilicon

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