Photomasks are the backbone of microfabrication industries. Currently they are fabricated by lithographic process, which is very expensive and time consuming since it is a several step process. These issues can be addressed by fabricating photomask by direct femtosecond laser writing, which is a single step process and comparatively cheaper and faster than lithography. In this paper we discuss about our investigations on the effect of two types of laser writing techniques, namely, front and rear side laser writing with regard to the feature size and the edge quality of the feature. It is proved conclusively that for the patterning of mask, front side laser writing is a better technique than rear side laser writing with regard to smaller feature size and better edge quality. Moreover the energy required for front side laser writing is considerably lower than that for rear side laser writing.
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