Initiated chemical vapor deposition of polymeric thin films : mechanism and applications

摘要

Initiated chemical vapor deposition (iCVD) is a novel technique for depositing polymeric thin films. It is able to deposit thin films of application-specific polymers in one step without using any solvents. Its uniqueness of in situ surface polymer synthesis distinguishes iCVD from conventional processes such as spin-on deposition and plasma-enhanced chemical vapor deposition. It allows engineering polymers to be made with specific microscale properties translating to well-defined macroscale behaviors. In this thesis work, two application-specific polymers based on poly(2-hydroxyethyl methacrylate) (PHEMA) and poly(cyclohexyl methacrylate) (PCHMA) were synthesized using iCVD. PHEMA thin films with specific degrees of cross-linking leading to well-defined structural, thermal, wetting, and swelling properties were made in a single vacuum step by simply adjusting chamber conditions. Cross-linked PCHMA thin films were synthesized for use as sacrificial layers for microfabrication. Such films of engineering polymers cannot be made using conventional methods. A study of the polymerization mechanism was included to serve as a groundwork for increased understanding of iCVD as a thin- film deposition method.