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Soft magnetic properties of Ni–Cr and Co–Cr alloy thin films electrodeposited from aqueous solutions containing trivalent chromium ions and glycine

机译:含有三价铬离子和甘氨酸的水溶液电沉积Ni-Cr和Co-Cr合金薄膜的软磁性能

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摘要

Ferromagnetic Ni-Cr and Co-Cr alloy thin films were electrodeposited from aqueous solution containing trivalent chromium ( Cr3+) ions and glycine. According to the Tafel slopes obtained from the cathode polarization curves for Ni-Cr and Co-Cr alloy deposition, it was estimated that Cr3+ ions inhibited Ni2? and Co2? ions from electrodepositing. Ni and Co preferentially electrodeposited rather than Cr and the electrodeposition process of Ni-Cr and Co-Cr was categorized to "normal co-deposition type." At the cathode potential of -1.8 V versus Ag/AgCl/KCl sat., Ni-9.5 %Cr and Co-8.4 %Cr alloy deposits were obtained. X-ray diffraction patterns of the electrodeposits revealed that pure Ni and pure Co consist of large crystal grains, while Ni-9.5 %Cr and Co-8.4 %Cr alloys were composed of a solid solution phase with fine crystal grains. Magnetization of Ni-9.5 %Cr and Co-8.4 %Cr alloy thin films with fine crystalline phase reached to saturation at ca. 2.5 kOe in perpendicular direction to the film plane, while pure Ni and pure Co thin film with large crystal grains were hardly magnetized in the perpendicular direction. Soft magnetic properties were improved with increasing Cr content in the deposits.
机译:从含三价铬(Cr3 +)离子和甘氨酸的水溶液中电沉积铁磁Ni-Cr和Co-Cr合金薄膜。根据从Ni-Cr和Co-Cr合金沉积的阴极极化曲线获得的Tafel斜率,估计Cr3 +离子抑制了Ni2 +。和二氧化碳?电沉积产生的离子Ni和Co优先于Cr而不是Cr被电沉积,并且Ni-Cr和Co-Cr的电沉积过程被分类为“正常共沉积类型”。在相对于Ag / AgCl / KCl饱和的-1.8V的阴极电位下,获得Ni-9.5%Cr和Co-8.4%Cr的合金沉积物。电沉积物的X射线衍射图表明,纯Ni和纯Co由大晶粒组成,而Ni-9.5%Cr和Co-8.4%Cr合金由具有细晶粒的固溶相组成。具有细晶相的Ni-9.5%Cr和Co-8.4%Cr合金薄膜的磁化强度达到约200℃。在垂直于膜平面的方向上为2.5kOe,而几乎没有在垂直方向上磁化具有大晶粒的纯Ni和纯Co薄膜。随着沉积物中Cr含量的增加,软磁性能得到改善。

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