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Anisotropic Magnetization Behavior of Electrodeposited Nanocrystalline Ni-Mo Alloy Thin Films and Nanowires Array

机译:电沉积纳米晶Ni-mo合金薄膜和纳米线阵列的各向异性磁化行为

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摘要

Nanocrystalline nickel-molybdenum (Ni-Mo) alloy thin films and nanowires array were synthesized in acidic aqueous solution containing citric acid using an induced co-deposition technique. Cross-sectional scanning ion microscope (SIM) images of the electrodeposits revealed that pure Ni consists of large crystal grains with diameter of several μm, while Ni-4.5%Mo alloy consists of columnar crystals with diameter of several hundred nm and long axis of the columnar crystals was arrayed vertically to the film plane. On the other hand, no crystal grains were found in Ni-23.6%Mo alloy which was composed of an amorphous phase. Electrodeposited pure Ni thin film was hardly magnetized in perpendicular direction to the film plane, while the magnetization of nanocrystalline Ni-11%Mo alloy thin film reached to saturation at ca. 2.5 kOe. On the contrary, Ni nanowires array was easily magnetized in perpendicular direction to the membrane film plane which corresponds to the long axis direction of nanowires, while the nanocrystalline Ni-8.4%Mo alloy nanowires array was magnetized isotropically in both direction and the soft magnetic property was improved with increasing Mo content in the electrodeposits.
机译:采用诱导共沉积技术在含有柠檬酸的酸性水溶液中合成了纳米晶镍钼(Ni-Mo)合金薄膜和纳米线阵列。电沉积的横截面扫描离子显微镜(SIM)图像显示,纯Ni由直径为几微米的大晶粒组成,而Ni-4.5%Mo合金由直径为几百纳米且长轴的柱状晶体组成。柱状晶体垂直于膜平面排列。另一方面,在由非晶相组成的Ni-23.6%Mo合金中没有发现晶粒。电沉积的纯Ni薄膜几乎没有在垂直于薄膜平面的方向上被磁化,而纳米晶Ni-11%Mo合金薄膜的磁化强度达到了大约。 2.5 kOe。相反,Ni纳米线阵列容易在垂直于膜膜平面的方向上被磁化,该膜膜平面对应于纳米线的长轴方向,而纳米晶Ni-8.4%Mo合金纳米线阵列在两个方向和软磁特性上各向同性地被磁化。随着电沉积中Mo含量的增加,铁的含量提高。

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