Trial Production of Large-Area Uniform Amorphous-Silicon Thin Films by Scanning Plasma Method

摘要

The modulated magnetic field perpendicular to an electric field was applied to plasma chemical vapour deposition process. The magnetic field was able to scan the plasma and to diffuse it within a wide range. This scanning plasma method (SPM) was applied to produce a large-area (20cm×160cm) uniform amorphous-silicon thin film. The experiment proved that the SPM is very effective to produce the large-area thin films.