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Modelling the deformation of nickel foil during manufacturing of nanostructures on injection moulding tool inserts

机译:在注塑工具插件上制造纳米结构期间模拟镍箔的变形

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摘要

In the present work, a manufacturing process for transferring nanostructures from a glass wafer, to a double-curvedinsert for injection moulding is demonstrated. A nanostructure consisting of sinusoidal cross-gratings with a period of 426 nm issuccessfully transferred to hemispheres on an aluminium substrate with three different radii; 500 μm, 1000 μm and 2000 μm,respectively. The nanoimprint is performed using a 50 μm thick nickel foil, manufactured using electroforming. During theimprinting process, the nickel foil is stretched due to the curved surface of the aluminium substrate. Experimentally, it is possibleto address this stretch by counting the periods of the cross-gratings via SEM characterization. A model for the deformation of thenickel foil during nanoimprint is developed, utilizing non-linear material and geometrical behaviour. Good agreement betweenmeasured and numerically calculated stretch ratios on the surface of the deformed nickel foil is found, and it is shown, that fromthe model it is also possible to predict the geometrical extend of the nanostructured area on the curved surfaces.
机译:在当前的工作中,展示了一种用于将纳米结构从玻璃晶圆转移到用于注射成型的双弯曲嵌件的制造工艺。由周期为426 nm的正弦形交叉光栅组成的纳米结构成功地转移到具有三个不同半径的铝基板上的半球中。分别为500μm,1000μm和2000μm。使用通过电铸制造的50μm厚的镍箔执行纳米压印。在压印过程中,镍箔由于铝基板的弯曲表面而被拉伸。实验上,可以通过SEM表征计算交叉光栅的周期来解决这一问题。利用非线性材料和几何行为,开发了纳米压印过程中镍箔变形的模型。发现在变形的镍箔表面上的测量拉伸比和数值计算的拉伸比之间具有良好的一致性,并且表明,根据该模型,还可以预测弯曲表面上的纳米结构区域的几何延伸。

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