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Determining the internal quantum efficiency of shallow-implanted nitrogen-vacancy defects in bulk diamond

机译:确定大块金刚石中浅埋氮空位缺陷的内量子效率

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摘要

It is generally accepted that nitrogen-vacancy (NV) defects in bulk diamond are bright sources of luminescence. However, the exact value of their internal quantum efficiency (IQE) has not been measured so far. Here we use an implementation of Drexhage's scheme to quantify the IQE of shallow-implanted NV defects in a single-crystal bulk diamond. Using a spherical metallic mirror with a large radius of curvature compared to the optical spot size, we perform calibrated modifications of the local density of states around NV defects and observe the change of their total decay rate, which is further used for IQE quantification. We also show that at the excitation wavelength of 532 nm, photo-induced relaxation cannot be neglected even at moderate excitation powers well below the saturation level. For NV defects shallow implanted 4.5 ± 1 and 8 ± 2 nm below the diamond surface, we determine the quantum efficiency to be 0.70 ± 0.07 and 0.82 ± 0.08, respectively.
机译:通常认为,块状金刚石中的氮空位(NV)缺陷是发光的亮源。但是,到目前为止,尚未测量其内部量子效率(IQE)的确切值。在这里,我们使用Drexhage方案的实现来量化单晶大块钻石中浅埋NV缺陷的IQE。使用与光斑尺寸相比具有较大曲率半径的球形金属镜,我们对NV缺陷周围的局部态密度进行了校正,并观察了其总衰减率的变化,这进一步用于IQE量化。我们还表明,在532 nm的激发波长下,即使在远低于饱和度的中等激发功率下,光致弛豫也不能忽略。对于在金刚石表面以下4.5±1和8±2 nm浅注入的NV缺陷,我们确定量子效率分别为0.70±0.07和0.82±0.08。

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