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Modelling the deformations during the manufacturing of nanostructures on non-planar surfaces for injection moulding tool inserts:Paper

机译:在用于注塑工具插件的非平面表面上制造纳米结构期间的变形建模:纸

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摘要

This paper presents a new manufacturing process for transferring nanostructures from a glass wafer to a curved aluminium insert for polymer injection moulding. A nanostructure consisting of sinusoidal cross-gratings with a period of 426 nm is successfully transferred to hemispheres with different radii via an embossing process. The embossing is done into a glass-like resist called HSQ, using a 50 μm thick nickel foil, manufactured with electroforming. During the imprinting process the nickel foil is stretched due to the curved surface of the aluminium substrate and it is experimentally possible to characterize this stretch by counting the periods of the cross-gratings via SEM characterization. A numerical model for simulating the deformation of the nickel foil during nanoimprint is also developed, utilizing non-linear material and geometrical behaviour. Good agreement between measured and numerically calculated stretch ratios on the surface of the deformed nickel foil is shown, and from the model it is also possible to predict the limiting boundary of the nanostructures on the curved surfaces, with decreasing radii.
机译:本文提出了一种新的制造工艺,该工艺可以将纳米结构从玻璃晶圆转移到用于聚合物注射成型的弯曲铝制嵌件中。由426 nm周期正弦形交叉光栅组成的纳米结构已通过压花工艺成功转移到半径不同的半球中。使用50微米厚的镍箔(通过电铸法制造),将压纹加工成称为HSQ的玻璃状抗蚀剂。在压印过程中,镍箔由于铝基板的弯曲表面而被拉伸,并且在实验上可以通过SEM表征计算交叉光栅的周期来表征这种拉伸。利用非线性材料和几何行为,还建立了用于模拟纳米压印过程中镍箔变形的数值模型。示出了在变形的镍箔的表面上测量的和数值计算的拉伸比之间的良好一致性,并且根据模型,还可以预测半径减小的弯曲表面上的纳米结构的极限边界。

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