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Plasmonic V-groove waveguides with Bragg grating filters via nanoimprint lithography

机译:等离子体V型槽波导与布拉格光栅滤波器通过纳米压印光刻

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摘要

We demonstrate spectral filtering with state-of-the-art Bragg gratings in plasmonic V-groove waveguides fabricated by wafer scale processing based on nanoimprint lithography. Transmission spectra of the devices having 16 grating periods exhibit spectral rejection of the channel plasmon polaritons with 8.2 dB extinction ratio and -3 dB bandwidth of Δλ = 39.9 nm near telecommunications wavelengths. Near-field scanning optical microscopy measurements verify spectral reflection from the grating structures, and the oscillations of propagating modes along grating-less V- grooves correspond well with effective refractive index values calculated by finite element simulations in COMSOL. The results represent advancement towards the implementation of plasmonic V-grooves with greater functional complexity and mass-production compatibility.
机译:我们展示了通过基于纳米压印光刻技术的晶圆规模加工制造的等离子V形槽波导中的最新Bragg光栅进行的光谱过滤。具有16个光栅周期的设备的透射光谱显示出在电信波长附近具有8.2 dB消光比和-3 dB带宽Δλ= 39.9 nm的信道等离激元极化子的光谱抑制。近场扫描光学显微镜测量验证了来自光栅结构的光谱反射,并且传播模式沿着无光栅V形凹槽的振荡与通过COMSOL中的有限元模拟计算出的有效折射率值非常吻合。结果表明,在实现具有更大功能复杂性和大规模生产兼容性的等离子V型槽方面取得了进展。

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