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Addressing the mechanical deformation of flexible stamps for nanoimprint lithography on double-curved surfaces

机译：解决双曲面纳米压印光刻柔性印模的机械变形问题

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Sonne Mads Rostgaard; Hattel Jesper Henri; Kristensen Anders;
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年度 2012
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正文语种 eng
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1. Modeling and simulation of the deformation process of PTFE flexible stamps for nanoimprint lithography on curved surfaces [J] . Sonne M. R., Smistrup K., Hannibal M., Journal of Materials Processing Technology . 2015,第Null期

机译：用于曲面纳米压印光刻的PTFE柔性印章变形过程的建模和仿真
2. Equalising stamp and substrate deformations in solid parallel-plate UV-based nanoimprint lithography [J] . Iris Bergmair, Michael Muehlberger, Markus Gusenbauer, Microelectronic Engineering . 2008,第5a6期

机译：固态平行板基于UV的纳米压印光刻中的均压印模和基材变形
3. Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography [J] . S. Merino, A. Retolaza, H. Schift, Microelectronic Engineering . 2008,第5a6期

机译：热纳米压印光刻中的压模变形及其对残余层均匀性的影响
4. Refined Coarse-Grain Modeling of Stamp Deformation in Nanoimprint Lithography [C] . S. Merino, A. Retolaza, A. Juarros, NSTI BioNano Conference and Trade Show . 2008

机译：纳米压印光刻中的精制粗晶模型
5. Understanding Material Deformation Mechanism in Nanoimprint Lithography for Engineering and Medical Applications [D] . Gaikwad, Abhaysinh. 2020

机译：了解工程和医疗应用纳米压印光刻材料变形机制
6. Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios [O] . Minqi Yin, Hongwen Sun, Haibin Wang 2018

机译：使用具有各种微/纳米比的印模进行的紫外线纳米压印光刻的抗蚀剂填充研究
7. Addressing the mechanical deformation of flexible stamps for nanoimprint lithography on double-curved surfaces [O] . Sonne Mads Rostgaard, Hattel Jesper Henri, Kristensen Anders 2012

机译：解决双曲面纳米压印光刻柔性印模的机械变形问题

Addressing the mechanical deformation of flexible stamps for nanoimprint lithography on double-curved surfaces

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