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Two Methods for Antialiased Wireframe Drawing with Hidden Line Removal

机译:具有隐藏线去除的抗线框图绘制的两种方法

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摘要

Two novel and robust techniques for wireframe drawing are proposed. Neither suffer from the well-known artifacts associated with the standard two pass, offset based techniques for wireframe drawing. Both methods draw prefiltered lines and produce high-quality antialiased results without super-sampling. The first method is a single pass technique well suited for convex N-gons for small N (in particular quadrilaterals or triangles). It is demonstrated that this method is more efficient than the standard techniques and ideally suited for implementation using geometry shaders. The second method is completely general and suited for arbitrary N-gons which need not be convex. Lastly, it is described how our methods can easily be extended to support various line styles.
机译:提出了两种新颖且鲁棒的线框绘制技术。两者都没有遭受与用于线框绘制的基于标准两遍,基于偏移的技术相关的众所周知的瑕疵。两种方法都绘制了预滤波的线,并且无需超采样即可产生高质量的抗锯齿结果。第一种方法是单程技术,非常适合于小N(特别是四边形或三角形)的凸N形。结果表明,该方法比标准技术更有效,并且非常适合使用几何着色器实现。第二种方法是完全通用的,适用于不需要凸的任意N个角。最后,描述了如何轻松扩展我们的方法以支持各种线条样式。

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