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Oxidation and reduction kinetics of eutectic SnPb, InSn, and AuSn: a knowledge base for fluxless solder bonding applications

机译:共晶snpb,Insn和ausn的氧化和还原动力学:无焊剂焊接应用的知识库

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摘要

For microelectronics and especially for upcoming new packaging technologies in micromechanics and photonics fluxless, reliable and economic soldering technologies are needed. In this article, we consequently focus on the oxidation and reduction kinetics of three commonly used eutectic solder alloys: (1) SnPb; (2) InSn; (3) AuSn. The studies of the oxidation kinetics show that the growth of the native oxide, which covers the solder surfaces from the start of all soldering operations is self-limiting. The rate of oxidation on the molten, metallic solder surfaces is significantly reduced with decreasing O2 partial-pressure. Using in situ Auger electron spectroscopy (AES) it could be shown for the first time, that H2 can reduce Sn-oxide as well as In-oxide at moderate heating duration and temperatures. In the second part of this study, the results, obtained by the investigation of oxidation and reduction kinetics, are applied to flip-chip (FC) bonding experiments in vacuum with and without the injection of H2. Wetting in vacuum is excellent but the self-alignment during flip-chip soldering is restricted. The desired, perfectly self-aligned FC-bonds have been only achieved, using evaporated and reflowed AuSn(80/20) and SnPb(60/40) after the introduction of H2
机译:对于微电子学,尤其是对于即将出现的微机械学和光子学新包装技术,需要无助焊剂,可靠且经济的焊接技术。因此,在本文中,我们将重点放在三种常用的共晶焊料合金的氧化和还原动力学上:(1)SnPb; (2)InSn; (3)金对氧化动力学的研究表明,从所有焊接操作开始就覆盖焊料表面的天然氧化物的生长是自限性的。随着氧气分压的降低,熔融金属焊料表面上的氧化速率显着降低。使用原位俄歇电子能谱(AES)可以首次证明,H2可以在适当的加热时间和温度下还原Sn氧化物和In-oxide。在本研究的第二部分中,通过研究氧化和还原动力学获得的结果将应用于有或没有注入H2的真空倒装芯片(FC)键合实验。真空中的润湿性极好,但倒装芯片焊接过程中的自对准受到限制。在引入H2之后,仅使用蒸发和回流的AuSn(80/20)和SnPb(60/40)才能实现所需的,完全自对准的FC键

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