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New generation of efficient high resolution detector for 30-100 keV photons

机译:用于30-100 keV光子的新一代高效高分辨率探测器

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摘要

For direct space X-ray imaging with an intrinsic spatial resolution of less than 10 µm scintillating detectors is used almost universally. The spatial resolution is limited by the thickness of the scintillator and by the numerical aperture of the optical connection between scintillator and photo detector. This establishes an inverse correlation between the spatial resolution and the detection efficiency which limits the performance of existing x-ray detectors. The purpose of this Ph.D. project is to explore alternative paths of research, to develop x-ray detectors for the 30-100 keV energy range with single micrometre resolution without compromising efficiency. A number of detector types have been evaluated for this purpose. Structured scintillators are found to exhibit a high potential in terms of performance and also in terms of realizing an actual detector. The structured scintillator consists of a silicon matrix of holes filled with the phosphor material, CsI:Tl. The generated luminescence of the phosphor is guided by the silicon structure through total internal reflection. The spatial resolution of the scintillator is given by the size of the holes which is fabricated down to a distance of 1 µm between pores. The potential of the structured scintillator is explored through Monte Carlo simulations. A spatial resolution of 1 µm is obtainable and for scintillators with a resolution between 1 µm and 8 µm the efficiency could be more than 15 times higher than a regular scintillator with corresponding spatial resolution. The porous silicon substrate for the structured scintillator is realized both with advanced electrochemical etching and highly refined plasma etching. These techniques can produce structures with an aspect ratio of more than 100. The process of filling scintillator into pores was developed to produce single crystals with a limited number of air bubbles. To obtain a smooth homogenous surface from the two materials; silicon and CsI, an index matching coating has been applied. Resolutions down to 1.3 µm at 50 keV have been measured and compared to conventional scintillators a 3-5 times gain in efficiency has been found. The homogeneity of the structured scintillators can be comparable to regular scintillators although so far the yield of useable samples from the coating process is low. The radiation hardness of the scintillator has been measured. Doses of more than 107 Gy from synchrotron white beam gives no decrease in performance on uncoated samples. However for coated samples the decrease in efficiency is above 50 % at the same dose and the polymer surface coating shows severe structural damage.
机译:对于固有空间分辨率小于10 µm的直接空间X射线成像,几乎普遍使用了闪烁探测器。空间分辨率受闪烁体的厚度和闪烁体与光电探测器之间光学连接的数值孔径的限制。这在空间分辨率和检测效率之间建立了逆相关性,从而限制了现有X射线检测器的性能。本博士的目的该项目将探索替代的研究途径,以30 keV keV的能量范围开发X射线探测器,其单微米分辨率不影响效率。为此目的,已经评估了许多类型的探测器。发现结构化闪烁体在性能方面以及在实现实际检测器方面都显示出高潜力。结构化闪烁体由填充有磷光体材料CsI:T1的孔硅基质组成。磷光体产生的发光由硅结构通过全内反射引导。闪烁体的空间分辨率由孔的尺寸决定,孔的尺寸小至孔之间的距离为1 µm。通过蒙特卡洛模拟探索了结构闪烁体的潜力。可获得1 µm的空间分辨率,对于分辨率在1 µm至8 µm之间的闪烁体,其效率可能比具有相应空间分辨率的常规闪烁体高15倍以上。通过先进的电化学蚀刻和高度精细的等离子体蚀刻,都可以实现结构化闪烁体的多孔硅基板。这些技术可以产生长宽比大于100的结构。开发了将闪烁体填充到孔中的过程,以产生带有有限数量气泡的单晶。用两种材料获得光滑均匀的表面;硅和CsI,已经应用了折射率匹配涂层。已测量出在50 keV时分辨率低至1.3 µm,并且与常规闪烁器相比,效率提高了3-5倍。结构化闪烁体的均质性可与常规闪烁体相媲美,尽管到目前为止,涂覆工艺中可用样品的产率很低。已经测量了闪烁体的辐射硬度。来自同步加速器白光束的剂量超过107 Gy时,未涂覆样品的性能不会降低。但是,对于涂层样品,在相同剂量下效率降低超过50%,并且聚合物表面涂层显示出严重的结构破坏。

著录项

  • 作者

    Olsen Ulrik Lund;

  • 作者单位
  • 年度 2009
  • 总页数
  • 原文格式 PDF
  • 正文语种 eng
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