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Substrate-induced structures of bismuth adsorption on graphene: a first principle study

机译:基质诱导的铋在石墨烯上的吸附结构:第一种   原理研究

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摘要

The geometric and electronic properties of Bi-adsorbed monolayer graphene,enriched by the strong effect of substrate, are investigated byfirst-principles calculations. The six-layered substrate, corrugated bufferlayer, and slightly deformed monolayer graphene are all simulated. Adatomarrangements are thoroughly studied by analyzing the ground-state energies,bismuth adsorption energies, and Bi-Bi interaction energies of different adatomheights, inter-adatom distance, adsorption sites, and hexagonal positions. Ahexagonal array of Bi atoms is dominated by the interactions between the bufferlayer and the monolayer graphene. An increase in temperature can overcome a$\sim 50$ meV energy barrier and induce triangular and rectangularnanoclusters. The most stable and metastable structures agree with the scanningtunneling microscopy measurements. The density of states exhibits a finitevalue at the Fermi level, a dip at $\sim -0.2$ eV, and a peak at $\sim -0.6$eV, as observed in the experimental measurements of the tunneling conductance.
机译:通过第一性原理计算研究了Bi吸附的单层石墨烯的几何和电子性质。六层基材,波纹状缓冲层和轻微变形的单层石墨烯均已模拟。通过分析不同原子高度,原子间距离,吸附位点和六边形位置的基态能,铋吸附能和Bi-Bi相互作用能,对原子排列进行了深入研究。 Bi原子的六边形阵列主要受缓冲层和单层石墨烯之间的相互作用的影响。温度升高可以克服50 meV的能垒,并诱发三角形和矩形纳米团簇。最稳定和亚稳态的结构与扫描隧道显微镜测量结果一致。如在隧穿电导的实验测量中所观察到的,状态密度在费米能级处显示出有限值,在$ sim_0.2eV处有一个下降,并且在$ sim-0.6eV处有一个峰值。

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