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Electronic- and band-structure evolution in low-doped (Ga,Mn)As

机译:低掺杂(Ga,mn)as中电子和带结构的演变

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摘要

Modulation photoreflectance spectroscopy and Raman spectroscopy have beenapplied to study the electronic- and band-structure evolution in (Ga,Mn)Asepitaxial layers with increasing Mn doping in the range of low Mn content, upto 1.2%. Structural and magnetic properties of the layers were characterizedwith high-resolution X-ray diffractometry and SQUID magnetometery,respectively. The revealed results of decrease in the band-gap transitionenergy with increasing Mn content in very low-doped (Ga,Mn)As layers withn-type conductivity are interpreted as a result of merging the Mn-relatedimpurity band with the host GaAs valence band. On the other hand, an increasein the band-gap-transition energy with increasing Mn content in (Ga,Mn)Aslayers with higher Mn content and p-type conductivity indicates theMoss-Burstein shift of the absorption edge due to the Fermi level locationwithin the valence band, determined by the free-hole concentration. Theexperimental results are consistent with the valence-band origin of mobileholes mediated ferromagnetic ordering in the (Ga,Mn)As diluted ferromagneticsemiconductor.
机译:调制光反射光谱法和拉曼光谱法已被用于研究(Ga,Mn)外延层中随着Mn掺杂量的增加,在低Mn含量范围内(1.2%),电子和能带结构的演变。分别用高分辨率X射线衍射法和SQUID磁力计表征了层的结构和磁性。在具有n型电导率的极低掺杂(Ga,Mn)As层中,随着Mn含量的增加,带隙跃迁能量降低的揭示结果被解释为将Mn相关杂质带与主体GaAs价带合并的结果。另一方面,在具有较高Mn含量和p型导电性的(Ga,Mn)层中,随着Mn含量的增加,带隙跃迁能量增加,这表明由于费米能级在其内部,吸收边缘的莫斯-布尔斯坦位移价带,由自由孔浓度决定。实验结果与(Ga,Mn)As稀释的铁磁半导体中移动孔介导的铁磁有序的价带起源一致。

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