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Effect of C-face 4H-SiC(0001) deposition on thermopower of single and multilayer graphene in AA, AB and ABC stacking

机译:C面4H-siC(0001)沉积对单晶硅和单晶硅热电势的影响   多层石墨烯在aa,aB和aBC堆叠中的应用

摘要

The Seebeck coefficient in multilayer graphene is investigated within thedensity-functional theory, using the semiclassical Boltzmann equations andinterpolating the bands in a maximally-localized Wannier functions basis set.We compare various graphene stackings (AA, AB and ABC) both free-standing anddeposited on a $4H$-SiC(0001) C-terminated substrate. We find that the presenceof the SiC substrate can significantly affect the thermopower properties ofgraphene layers, depending on the stacking, providing a promising way to tailorefficient graphene-based devices.
机译:使用半经典的Boltzmann方程并在最大局部的Wannier函数基集中对能带进行插值,在密度泛函理论下研究了多层石墨烯的塞贝克系数。 $ 4H $ -SiC(0001)C端基。我们发现,SiC衬底的存在会严重影响石墨烯层的热电性能,具体取决于堆叠情况,从而为定制高效的石墨烯基器件提供了一种有前途的方法。

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