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Buffer influence on magnetic dead layer, critical current and thermal stability in magnetic tunnel junctions with perpendicular magnetic anisotropy

机译:缓冲器对磁性死区,临界电流和热量的影响   具有垂直磁各向异性的磁隧道结中的稳定性

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摘要

We present a thorough research on Ta/Ru-based buffers and their influence onfeatures crucial from the point of view of applications of MTJs, such ascritical switching current and thermal stability. We investigate devicesconsisting of buffer/FeCoB/MgO/FeCoB/Ta/Ru multilayers for three differentbuffers: Ta 5 / Ru 10 / Ta 3, Ta 5 / Ru 10 / Ta 10 and Ta 5 / Ru 20 / Ta 5 (allthicknesses in nm). In addition, we study systems with a single FeCoB layerdeposited above as well as below the MgO barrier. The crystallographic textureand the roughness of the buffers are determined by means of XRD and atomicforce microscopy measurements. Furthermore, we examine the magnetic domainpattern, the magnetic dead layer thickness and the perpendicular magneticanisotropy fields for each sample. Finally, we investigate the effect of thecurrent induced magnetization switching for nanopillar junctions with lateraldimensions ranging from 1 {\mu}m down to 140 nm. Buffer Ta 5 / Ru 10 / Ta 3,which has the thickest dead layer, exhibits a large increase in the thermalstability factor while featuring a slightly lower critical current densityvalue when compared to the buffer with the thinnest dead layer Ta 5 / Ru 20 /Ta 5.
机译:从MTJ的应用(例如关键开关电流和热稳定性)的角度出发,我们对基于Ta / Ru的缓冲器及其对关键功能的影响进行了深入研究。我们研究了由以下三种不同的缓冲液组成的设备:缓冲液/ FeCoB / MgO / FeCoB / Ta / Ru多层膜:Ta 5 / Ru 10 / Ta 3,Ta 5 / Ru 10 / Ta 10和Ta 5 / Ru 20 / Ta 5(所有纳米厚度)。此外,我们研究了在MgO势垒的上方和下方均沉积有单个FeCoB层的系统。借助X射线衍射和原子力显微镜测量来确定缓冲液的晶体织构和粗糙度。此外,我们检查了每个样品的磁畴图案,磁死层厚度和垂直磁各向异性场。最后,我们研究了横向尺寸范围为1 {μm}至140 nm的纳米柱结的电流感应磁化转换的影响。与具有最薄死层Ta 5 / Ru 20 / Ta的缓冲器相比,具有最厚死角的缓冲器Ta 5 / Ru 10 / Ta 3表现出热稳定性因子的大幅增加,同时具有临界电流密度值略低的特征5,

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