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Interface traps in graphene field effect devices: extraction methods and influence on characteristics

机译:石墨烯场效应器件中的界面陷阱:提取方法和  对特征的影响

摘要

We study impact of the near-interfacial oxide traps on the C-V and I-Vcharacteristics of graphene gated structures. Methods of extraction ofinterface trap level density in graphene field effect devices from thecapacitance-voltage measurements are described and discussed. It has been foundthat the effects of electron-electron or hole-hole interactions andelectron-hole puddles can be mixed in C-V characteristics putting obstacles inthe way of uniquely determined extraction of the interface trap density ingraphene. Influence of the interface traps on DC and AC capacitance andconductance characteristics of graphene field-effect structures is described.It has been shown that variety of widths of resistivity peaks in varioussamples could be explained by different interface trap capacitance values.
机译:我们研究了近界面氧化物陷阱对石墨烯门控结构的C-V和I-V特性的影响。描述并讨论了从电容-电压测量中提取石墨烯场效应器件中界面陷阱能级密度的方法。已经发现,电子-电子或空穴-空穴相互作用和电子-空穴水坑的影响可以混合在C-V特性中,从而以唯一确定的方式提取界面陷阱密度石墨烯成为障碍。描述了界面陷阱对石墨烯场效应结构的直流和交流电容及电导特性的影响。研究表明,可以通过不同的界面陷阱电容值来解释不同样品中电阻率峰的宽度。

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